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Home > Issues > Volume 5 (2000) > No.4(pp.111-143)

Interlayer Coupling of CoFe/Cu/NiFe Trilayer Films

Journal of Magnetics, Volume 5, Number 4, 31 Dec 2000, Pages 139-142
Jong-Sung Baek(Department of Physics Korea University, Institute of Science and Technology, Korea University), Woo-Woung Lim(Department of Physics, Korea University), Soo-Hyung Lee(Department of Physics, Chongju University), Mee-Yang Kim(Department of Physics, Sookmyung Women's University), Jang-Roh Rhee(Department of Physics, Sookmyung Women's University)
Abstract
The interlayer coupling between adjacent ferromagnetic layers was examined for CoFe/Cu/NiFe trilayer systems. A series of films of CoFe (20 nm)/Cu(tCu)/NiFe (20 nm) trilayers with Cu spacer thickness, tCu, in the range of 1~10 nm was deposited on Si(100) wafers at room temperature by DC magnetron sputtering. In order to understand the dependence of the magnetic interaction between ferromagnetic Co90Fe10 (wt.%) and Ni81Fe19 (wt.%) layers separated by a nonmagnetic Cu spacer on the Cu layer thickness, we investigated the derivative ferromagnetic resonance (FMR) spectra. The FMR results were analyzed using the model of Layadi and Art-man for interlayer interaction. The interlayer coupling constant decreases in an oscillatory manner as the Cu spacer thickness increases up to 10 nm and approaches zero above 10 nm. The interlayer coupling constant is positive for all samples. Hence, it seems that the exchange coupling between adjacent CoFe and NiFe layers separated by a Cu layer is ferromagnetic.
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