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Home > Issues > Volume 5 (2000) > No.4(pp.111-143)

Magnetic Hardening of Nano-thick Films Grown by Pulsed Laser Deposition

Journal of Magnetics, Volume 5, Number 4, 31 Dec 2000, Pages 124-129
Choong Jin Yang(Electromagnetic Materials Lab., Research Institute of Industrial Science and Technology(RIST)), Jianmin Wu(Dept. 2, Center Iron and Steel Research Institute)
Abstract
Sm2Fe17Nx film magnets were prepared using a Sm2Fe17 target in a N2 gas atmosphere using a Nd-YAG pulsed laser ablation technique. The effect of nitrogen pressure, deposition temperature, pulse time and film thickness on the structure and magnetic properties of Sm2Fe17Nx film were studied. Increasing the nitrogen pressure up to 5 atm led to the formation of complete Sm2Fe17Nx compound. Optimized magnetic properties with the nitrogenation temperature in the range 500-530 ℃ could be obtained by extending the nitrogenation time up to 4 hours. Relatively low coercivities of 400~600 Oe were found in Sm2Fe17Nx films 50~100 nm thick, while a 4πMs of 10~12 kG could be achieved. In-plane anisotropy, which was the basic goal in this study, was achieved by controlling the nitrogenation parameters.
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