Considerable attention has been given to controlling magnetic anisotropy for future flexible spintronic devices
because the magnetization behavior of magnetic thin film and device changes with the bending stress, which is
known as the inverse-magnetostriction effect. The net magnetic anisotropy resulting from the fabrication process
plays a significant role in determining the working functions for magnetic field applications. In this study,
the variation of intrinsic magnetic anisotropy in permalloy thin films was investigated depending on the dcmagnetron
sputtering position. The randomly formed magnetic easy-axis was finally controlled by the application
of magnetic field during the sample deposition.