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No.4(pp.115-181)

Home > Issues > Volume 13 (2008) > No.4(pp.115-181)

Stress Effects CoCr₂O₄Film on MgO and MgAl₂O₄Grown by RF-Sputter Process

Journal of Magnetics, Volume 13, Number 4, 31 Dec 2008, Pages 163-166

Hoon Ko(Department of Physics, Kookmin University), Kang-Ryong Choi(Department of Physics, Kookmin University), Seung-Iel Park(Department of Physics, Kookmin University), In-Bo Shim(Department of Physics, Kookmin University), Sam-Jin Kim(Department of Physics, Kookmin University), Chul-Sung Kim*

(Department of Physics, Kookmin University)

Abstract

Multiferroic CoCr₂O₄film was deposited on MgO and MgAl₂O₄substrates by the rf-sputtering process. The films were prepared at an RF-magnetron sputtering power of 50 W and a pressure of 10 mtorr (20 sccm in Ar), and at substrate temperatures of 550℃. The crystal structure was determined to be a spinel (Fd-3m) structure by means of X-ray diffraction (XRD) with Cu K[/yen?]'a radiation. The thickness and morphology of the films were measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The magnetic properties were measured using a Superconducting Quantum Interference Device (SQIUD) magnetometer. While the ferrimagnetic transitions were observed at about 93 K, which was determined as the Neel temperature, the magnetic properties all show different behaviors. The differences between the magnetic properties can be explained by the stress effects between CoCr₂O₄and the substrates of MgO and MgAl₂O₄.

Keywords: multiferroic; RF sputtering

DOI: 10.4283/JMAG.2008.13.4.163

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