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No.2(pp.37-80)

Home > Issues > Volume 13 (2008) > No.2(pp.37-80)

Soft-Lithographic Fabrication of Ni Nanodots Using Self-Assembled Surface Micelles

Journal of Magnetics, Volume 13, Number 2, 30 Jun 2008, Pages 53-56

Young-Soo Seo(Nano Advanced Materials Engineering, Sejong University), Jung-Soo Lee(Korea Atomic Energy Research Institute), Kyung-Il Lee(Center for Spintronics Research, Korea Institute of Science & Technology), Tae-Wan Kim*

(Nano Advanced Materials Engineering, Sejong University)

Abstract

This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.

Keywords: Ni nanodot; self-assembly; nano-patterning process; diblock copolymer; surface micelle

DOI: 10.4283/JMAG.2008.13.2.53

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