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No.3(pp.93-132)
Home > Issues > Volume 12 (2007) > No.3(pp.93-132)
 
Effect of Electrodeposition Condition on GMR Co/Cu Multilayers
Journal of Magnetics, Volume 12, Number 3, 30 Sep 2007, Pages 124-128
Young-Woo Rheem* (Department of Chemical and Environmental Engineering and Center for Nanoscale Science and Engineering, University of California-Riverside), Bong-Young Yoo(Department of Chemical and Environmental Engineering and Center for Nanoscale Science and Engineering, University of California-Riverside)
Abstract
Co/Cu GMR multilayers were electrodeposited from various electrolytes using the dual bath technique to achieve high sensitive GMR multilayers. GMR ratio and sensitivity were strongly influenced by solution compositions and electrodeposition parameters where GMR and sensitivity of 12% and 0.052%/Oe were achieved from pyrophosphate baths. The effect of plating conditions on properties of Co/Cu multilayers may be attributed to crystallinity and grain size of deposits, and the ability of plating solutions to deposit contiguous films at lower nano thicknesses.
Keywords: giant magnetoresistance; electrodeposition; multilayer
DOI: 10.4283/JMAG.2007.12.3.124
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