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No.2(pp.61-102)

Home > Issues > Volume 11 (2006) > No.2(pp.61-102)

Increment of the Exchange Coupling in Fe-Ni Alloy Thin Films Deposited with a Bias Magnetic Field

Journal of Magnetics, Volume 11, Number 2, 30 Jun 2006, Pages 77-82

Kyung-Hunn Han*

(Proton Engineering Frontier Project, Korea Atomic Energy Research Institute), Jung-Gi Kim(Department of Physics, Hanyang University), Jae-Hun Cho(Department of Physics, Inha University), Suk-Mock Lee(Department of Physics, Inha University)

Abstract

The structure and magnetic properties of Fe-Ni films, deposited by DC magnetron sputtering on Si(111) wafer, have been studied. The spin wave stiffness constant is determined by Brillouin light scattering (BLS) and compared with the value obtained from magnetization measurements. The range of exchange interaction was determined as 0.4 atomic distances in the film deposited in a bias magnetic field, which is 1/2 that in the film grown in no bias magnetic field. The results show that the dimensions of exchange coupling increased by the sputtering in the magnetic field.

Keywords: brillouin light scattering; soft magnetic film; Fe-Ni alloy; spin wave stiffness; exchange interaction

DOI:

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