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No.4(pp.129-168)

Home > Issues > Volume 8 (2003) > No.4(pp.129-168)

The Influence of Thermal Annealing on Magnetostatic Properties of thin Ni Films

Journal of Magnetics, Volume 8, Number 4, 31 Dec 2003, Pages 133-137

E.E. Shalyguina(Physical Faculty, Moscow State University), Chong-Oh Kim*

(Department of Materials Engineering, Chungnam National University), Cheol-Gi Kim(Department of Materials Engineering, Chungnam National University), Jung-Hwa Seo(Department of Materials Engineering, Chungnam National University)

Abstract

The magnetostatic properties of the as-deposited and annealed at T=300 and 400 Ni films were investigated employing both magneto-optical magnetometer and VSM. The Ni films of 50∼200 nm thicknesses were prepared by DC magnetron sputtering technique. The strong influence of annealing temperature on magnetostatic properties of the studied samples was discovered. For the annealed Ni films, the increase of the coercivity Hc (up to 4 times) in comparison with that of as-deposited samples was revealed. The obtained results were explained by using crystallographic structural data of the samples.

Keywords: Coercivity; Hysteresis loop; Magnetic film; Magneto-optical effect

DOI:

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