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| Control of Thin Film Media Microstructure by Using Very Thin Seedlayer Material with Different Affinity for Oxygen |
| Journal of Magnetics, Volume 7, Number 3, 30 Sep 2002, Pages 106-114 |
D.D. Djayaprawira*  (Department of Electronic Engineering, Graduate School of Engineering, Tohoku Univ.), Satoru Yoshimura(New Industry Creation Hatchery Center, Tohoku Univ.), Migaku Takahashi(New Industry Creation Hatchery Center, Tohoku Univ.) |
| Abstract |
| To reduce the grain size and the media noise in a typical CrMo/CoCrPtB longitudinal media, a sputtering process which includes the exposure of oxygen onto the surface of CrWx (x=0, 25, 50, 75, 100 at.%) and CrTi15 seedlayers with the thickness of 0.5 nm have been utilized. The main results are: (1) the media grain size and the media noise are reduced when using CrWx (x=0, 25, 50 at.%) seedlayers, and not reduced when using CrTi15 or CrWx (x=75, 100 at.%) seedlayers, (2) AES and RHEED results suggest that W seedlayer, which has the highest melting point, forms layer-like film with very small and dense island grain, due to its high free surface energy and low mobility. On the other hand, CrW50 and Cr seedlayers, which have lower melting point than W seedlayer, form island film, (3) to effectively reduce the media grain size and improve the media signal to noise ratio, it is essential to utilize a very thin Cr-based seedlayer with high affinity for oxygen and which forms island-like structure, such as CrW50 seedlayer. |
| Keywords: thin film media; very thin seedlayer; melting point; island or layer-like structure; AES and RHEED. |
| DOI: |
| Full Text: PDF |
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