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No.1(pp.1-25)
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Effect of ECR-Ion Milling on Exchange Biasing in NiO/NiFe Bilayers
Journal of Magnetics, Volume 5, Number 1, 31 Mar 2000, Pages 23-25
D. G. Hwang(Department of Physics, Sangji University), S. S. Lee(Department of Physics, Sangji University), K. H. Lee(Department of Physics, Sangji University), K. B. Lee(Department of Physics, Sangji University), D. H. Park(Department of Physics, Sangji University), H. S. Lee(Department of Physics, Sangji University)
Abstract
We have investigated the effects of Ar and O2-ion milling on the exchange coupling field (Hex) and coercive field (Hc) at the interfaces between substrates and NiO/NiFe films, to understand the exchange biasing mechanism. The O2-ion milling was successfully performed by means of the electron cyclotron resonance (ECR) process. We found that the local roughness gradient of the NiO surface increased by O2-ion milling. The ratio of Hex/Hc increased from 0.87 to 1.77, whereas Hc decreased by almost a half as a results of the ion milling. The decrease in Hc could be interpreted as due to the refinement of magnetic domain size, which arose from the increase of the local roughness gradient of the NiO surface. The decrease in low Hc and increase in Hex in NiO spin valves by ECR-ion milling are in the right direction far use in magnetoresistance (MR) heads.
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