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No.3(pp.73-106)

Home > Issues > Volume 4 (1999) > No.3(pp.73-106)

Effect of Columnar Structures on Exchange Anisotropy Field in Magnetoresistive NiO/NiFe Bilayers

Journal of Magnetics, Volume 4, Number 3, 30 Sep 1999, Pages 88-91

Jai-Young Kim(Electro-Mechanics Lab., System & Control Sector, Samsung Advanced Institute of Technology), Gyeong-Su Park(AE Lab. TCS Center, Samsung Advanced Institute of Technology), Jae-Chul Ro(Department of Metallurgical Engineering, Sung-Kyun-Kwan University), Su-Jeong Suh(Department of Metallurgical Engineering, Sung-Kyun-Kwan University)

Abstract

A series of NiO/NiFe bilayer films are deposited with the variation of Ar sputtering pressure for the NiO layers only. As the pressure for the NiO layers increases, the exchange anisotropy field (H_EX) decreases gradually and becomes extinct at 2.5 mTorr, at which the maximum coercive force (H_C) in the NiO/NiFe films is obtained. Randomly oriented columnar structures with H_EX a few tens of Oe and oriented columnar structures with zero H_EX are observed in the NiP layers by highvoltage hihg-resolution transmission electron microscopy. The vanishing of the H_EX in the oriented structures is attributed to the lack of exchange anisotropy energy (E_EX) between NiO and NiFe layers, which results in little contribution of interfacial unidirectional pinning anisotropy to the interface of NiO/NiFe bilayer.

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